DocumentCode :
963971
Title :
Generation and application of ultrafast X-ray sources
Author :
Murnane, Margaret M. ; Kapteyn, Henry C. ; Falcone, Roger W.
Author_Institution :
Dept. of Phys., California Univ., Berkeley, CA, USA
Volume :
25
Issue :
12
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
2417
Lastpage :
2422
Abstract :
Pulses at soft X-ray wavelengths with a duration of less than 1.5 ps were produced by focusing high-intensity, ultrafast visible laser pulses onto a solid. Reflectivity measurements indicate that the laser pulses are absorbed by a plasma formed just inside the surface of the solid before expansion occurs. The observed emission spectrum is characteristic of a high-temperature, short-lived, high-density plasma. Applications of the ultrafast X-ray pulses, including an X-ray laser scheme, are discussed
Keywords :
X-ray emission spectra; X-ray lasers; X-ray production; focusing; high-speed optical techniques; plasma production and heating by laser beam; reflectivity; 1.5 ps; X-ray laser scheme; X-ray pulses; X-ray source applications; X-ray source generation; emission spectrum; high intensity laser pulses; high-density plasma; laser pulse absorbing plasma; laser pulse focusing; reflectivity measurements; soft X-ray wavelengths; solids expansion; ultrafast X-ray pulses; ultrafast X-ray sources; ultrafast visible laser pulses; Optical pulses; Plasma applications; Plasma measurements; Plasma properties; Plasma x-ray sources; Pulse measurements; Reflectivity; Solid lasers; Wavelength measurement; X-ray lasers;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/3.40624
Filename :
40624
Link To Document :
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