Title :
Resistance adjustment with short-pulse Nd:YAG laser for RuO2 -based thick-film resistors buries in polyimide film
Author :
Gofuku, Eishi ; Ohnawa, Toshio ; Kohara, Masanobu ; Nunoshita, Masahiro
Author_Institution :
Mitsubishi Electr. Corp., Hyogo, Japan
fDate :
9/1/1993 12:00:00 AM
Abstract :
To adjust the resistance of thick-film resistors (TFRs) buried in polyimide film, a process using a laser is proposed. Short-duration pulses from an Nd:YAG laser are used to irradiate the TFRs through the polyimide film. The TFR surface is modified thermochemically, and the resistance is reduced by an increasing amount with an increasing number of laser pulses. Because a 5-ns laser pulse is too short to start vaporization, no degradation of the polyimide film occurs. Temperature dependences of resistance show that the electrical conduction in the laser-modified TFR differs from that in the original TFR, because of higher electron density
Keywords :
laser beam applications; ruthenium compounds; thick film resistors; 5 ns; Nd:YAG laser; RuO2; TFR surface; electrical conduction; electron density; polyimide film; resistance adjustment; short-duration laser pulses; thick-film resistors; Degradation; Electric resistance; Optical pulses; Polyimides; Pulsed laser deposition; Resistors; Surface emitting lasers; Surface resistance; Temperature dependence; Thermal resistance;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
