Title :
Approximations to two-step diffusion process by Prony´s method
Author :
Selvakumar, C.R.
Author_Institution :
Indian Institute of Technology, Madras, India
fDate :
5/1/1982 12:00:00 AM
Abstract :
A simple two-term approximation that is accurate over a wide range of drive-in ratios is given for the two-step diffusion process. Comparison with earlier approximations are graphically given. The final approximation is simple and convenient in evaluating the device performance. The Prony´s method adopted to approximate erfc(x) is useful in approximating other profiles as well, such as anomalous diffusion profile of phosphorus, ion-implanted profile, etc.
Keywords :
Diffusion processes; Equations; Equivalent circuits; Frequency; Impedance measurement; Insertion loss; Loss measurement; Notice of Violation; Power measurement; Voltmeters;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/PROC.1982.12336
