Semiconductor fabrication technology applied to micrometer valves

Author

Lee, Rosemary A. ; Patel, Chan ; Williams, Helen A. ; Cade, Neil A.

Author_Institution

GEC Hirst Res. Centre, Wembley, UK

Volume

36

Issue

11

fYear

1989

fDate

11/1/1989 12:00:00 AM

Firstpage

2703

Lastpage

2708

Abstract

The authors describe the first stages of process development of silicon field-emitting structures together with novel techniques for improving individual processing steps. It is demonstrated that refined lithographic techniques, originally developed for semiconductor device fabrication, can be readily applied to the manufacture of micrometer-sized field emitters. The modifications needed for optimum tip shaping and dielectric planarization are examined in detail, and satisfactory results are obtained.

Keywords

cathodes; electron field emission; electron tube manufacture; elemental semiconductors; etching; lithography; semiconductor technology; silicon; vacuum tubes; Si; cold cathodes; dielectric planarization; field-emitting structures; integrated vacuum tubes; micrometer valves; optimum tip shaping; semiconductor fabrication technology; vacuum microelectronics; Cathodes; Current density; Dielectrics; Equations; Fabrication; Insulation; Lithography; Microelectronics; Planarization; Refining; Semiconductor device manufacture; Semiconductor devices; Silicon; Vacuum technology; Valves;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

jour

DOI

10.1109/16.43776

Filename

43776