• DocumentCode
    966114
  • Title

    Identification and implication of a perimeter tunneling current component in advanced self-aligned bipolar transistors

  • Author

    Li, G.P. ; Hackbarth, Edward ; Chen, Tze-Chiang

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    35
  • Issue
    1
  • fYear
    1988
  • fDate
    1/1/1988 12:00:00 AM
  • Firstpage
    89
  • Lastpage
    95
  • Abstract
    The identification of a perimeter tunneling current in the base-emitter junction of advanced double-poly self-aligned bipolar transistors has been verified by measuring based current as a function of temperature, bias voltage, and device perimeter-to-area ratio. The perimeter tunneling current at forward bias is found to be predominantly an excess tunneling that depends on the sidewall oxide interface properties, while that at reverse bias is due to band-to-band tunneling resulting from the emitter and extrinsic base profile overlap. Based on experimental results and an analysis of base-leakage-current trade-offs at forward and reverse bias, a device design concept was developed to enhance device performance and processing yield in scaled bipolar transistors
  • Keywords
    bipolar transistors; leakage currents; tunnelling; band-to-band tunneling; base-emitter junction; base-leakage-current trade-offs; based current; bias voltage; extrinsic base profile overlap; perimeter tunneling current component; self-aligned bipolar transistors; sidewall oxide interface properties; Area measurement; Bipolar transistors; Current measurement; Diodes; Leakage current; Performance analysis; Resistance heating; Temperature; Tunneling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.2420
  • Filename
    2420