DocumentCode :
966995
Title :
Production Techniques for Integrated Electronics
Author :
Fuller, W.D.
Author_Institution :
Lockheed Missiles and Space Company
Volume :
7
Issue :
3
fYear :
1963
fDate :
7/1/1963 12:00:00 AM
Firstpage :
20
Lastpage :
32
Abstract :
Integrated components made by using thin film and semiconductor techniques have an important part in the design and fabrication of physically smaller, more reliable electronic systems. The general processes of materials preparation, metallizing, circuit pattern formation, materials modification, pattern modification, lead attachment and protection are presented for both thin film and semiconductor integrated components. Comparative evaluation indicates that a combination of the two technologies will be used to meet the requirements of the sixties.
Keywords :
Fabrication; Inorganic materials; Integrated circuit metallization; Integrated circuit reliability; Materials preparation; Pattern formation; Production; Semiconductor device reliability; Semiconductor thin films; Thin film circuits;
fLanguage :
English
Journal_Title :
Product Engineering and Production, IEEE Transactions on
Publisher :
ieee
ISSN :
0097-4544
Type :
jour
DOI :
10.1109/TPEP.1963.1136400
Filename :
1136400
Link To Document :
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