• DocumentCode
    966995
  • Title

    Production Techniques for Integrated Electronics

  • Author

    Fuller, W.D.

  • Author_Institution
    Lockheed Missiles and Space Company
  • Volume
    7
  • Issue
    3
  • fYear
    1963
  • fDate
    7/1/1963 12:00:00 AM
  • Firstpage
    20
  • Lastpage
    32
  • Abstract
    Integrated components made by using thin film and semiconductor techniques have an important part in the design and fabrication of physically smaller, more reliable electronic systems. The general processes of materials preparation, metallizing, circuit pattern formation, materials modification, pattern modification, lead attachment and protection are presented for both thin film and semiconductor integrated components. Comparative evaluation indicates that a combination of the two technologies will be used to meet the requirements of the sixties.
  • Keywords
    Fabrication; Inorganic materials; Integrated circuit metallization; Integrated circuit reliability; Materials preparation; Pattern formation; Production; Semiconductor device reliability; Semiconductor thin films; Thin film circuits;
  • fLanguage
    English
  • Journal_Title
    Product Engineering and Production, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0097-4544
  • Type

    jour

  • DOI
    10.1109/TPEP.1963.1136400
  • Filename
    1136400