Title :
Monte Carlo simulation of impact ionization rates in InAlAs-InGaAs square and graded barrier superlattice
Author :
Watanabe, Isao ; Torikai, Toshitaka ; Taguchi, Kenko
Author_Institution :
Opto-Electron. Res. Labs., NEC Corp., Tsukuba, Japan
fDate :
10/1/1995 12:00:00 AM
Abstract :
The Monte Carlo method is used to analyze impact ionization rates for electrons and holes in a ⟨100⟩ crystal direction In0.52Al0.48As-In0.53Ga0.47 As square and graded barrier superlattice. The calculated impact ionization rate ratio α/β is enhanced to more than 10 in a wide barrier and narrow-well square barrier superlattice. This is because the hole ionization rate β is greatly reduced in the narrower well superlattice, while the electron ionization rate α is less sensitive to well and barrier layer thickness. These results are explained by a combination of the ionization dead space effect for the barrier layer and the electron ionization rate enhancement in the well layer due to large conduction band edge discontinuity. Furthermore, it is found that in a graded barrier superlattice, the impact ionization rate ratio α/β is smaller than that for a square barrier superlattice having the same barrier and well thickness. This is due to the occurrence of hole ionization in the narrow bandgap region in graded barriers. The band structure effects on hot carrier energy distribution, as well as impact ionization, are also discussed
Keywords :
III-V semiconductors; Monte Carlo methods; aluminium compounds; avalanche photodiodes; conduction bands; gallium arsenide; hot carriers; impact ionisation; indium compounds; semiconductor superlattices; In0.52Al0.48As-In0.53Ga0.47 As; InAlAs-InGaAs; InAlAs-InGaAs graded barrier superlattice; InAlAs-InGaAs square barrier superlattice; Monte Carlo simulation; band structure effects; barrier layer thickness; electron ionization rate; graded barriers; hole ionization rate; hot carrier energy distribution; impact ionization rates; ionization dead space effect; large conduction band edge discontinuity; narrow bandgap region; narrow-well; superlattice APD; well layer thickness; wide barrier; Charge carrier processes; Conducting materials; Hot carriers; Impact ionization; Indium phosphide; Laboratories; National electric code; Optical noise; Signal to noise ratio; Superlattices;
Journal_Title :
Quantum Electronics, IEEE Journal of