Title :
Trenches for building blocks of advanced planar components
Author_Institution :
COM Centre, Tech. Univ. of Denmark, Kgs. Lyngby, Denmark
fDate :
5/1/2004 12:00:00 AM
Abstract :
Trenches are fundamental structures used to build advanced optical planar waveguide components. The fabrication of trenches across silica-on-silicon waveguides using inductively coupled plasma etching is presented. These trenches were etched deep into the silicon substrate and their widths were varied between 24 and 100 μm. The insertion loss for waveguides with 24- and 28-μm-wide trenches etched across them were measured for trenches filled with air and oil. The measured results followed those expected from simulations.
Keywords :
optical fabrication; optical losses; optical planar waveguides; optical waveguide components; semiconductor-insulator boundaries; silicon compounds; sputter etching; 24 to 100 mum; 24-/spl mu/m trenches; 28-/spl mu/m trenches; Si; SiO/sub 2/-Si; advanced planar components; building blocks; hybrid integrated circuit fabrication; inductively coupled plasma etching; insertion loss; optical planar waveguide components; silica-on-silicon optical waveguide components; silica-on-silicon waveguides; silicon substrate; trenches; Etching; Optical device fabrication; Optical devices; Optical planar waveguides; Optical waveguide components; Optical waveguides; Planar waveguides; Plasma applications; Plasma measurements; Plasma waves;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2004.826052
