Title :
Submicron resolution deep UV photolithography
Author :
Voshchenkov, A.M. ; Herrmann, Harald
Author_Institution :
Bell Telephone Laboratories, Holmdel, USA
Abstract :
A vacuum contact printing technique was used to evaluate the resolution limits of deep UV photolithography with a 300±30 nm exposure band. For the first time, an array of 200 chip sites containing 0.5 ¿m meander patterns 3 cm long was clearly resolved in AZ 2415 positive resist across 2 in diameter silicon wafers.
Keywords :
integrated circuit technology; photolithography; silicon; AZ 2415 positive resist; Si wafers; chip sites; deep UV photolithography; meander patterns; resolution limits; vacuum contact printing technique;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19810044
