Title :
24-84-GHz gyrotron systems for technological microwave applications
Author :
Bykov, Yu. ; Eremeev, A. ; Glyavin, M. ; Kholoptsev, V. ; Luchinin, A. ; Plotnikov, I. ; Denisov, G. ; Bogdashev, A. ; Kalynova, G. ; Semenov, V. ; Zharova, N.
Author_Institution :
Inst. of Appl. Phys., Russian Acad. of Sci., Nizhny Novgorod, Russia
Abstract :
During the last decade, a line of gyrotrons ranging in frequency from 24 to 84 GHz with the output power from 3 to 35 kW continuous wave, and a series of gyrotron-based systems have been developed by the Institute of Applied Physics, Nizhny Novgorod, Russia, jointly with GYCOM, Ltd., Nizhny Novgorod. Main technical characteristics of the gyrotrons, as well as the architecture of the gyrotron-based millimeter-wave power sources for applications are presented. The purposely developed transmission lines, applicators, and power control make gyrotron systems flexible and easily adaptable tools for research and development. A number of millimeter-wave technologies are extensively studied today using gyrotron systems; ceramics sintering and joining (including nanoceramics), functionally graded coatings, rapid annealing of semiconductors, microwave plasma assisted chemical vapor deposition, multiply charged ion production are among the most advanced development.
Keywords :
gyrotrons; millimetre wave tubes; 24 to 84 GHz; 3 to 35 kW; GYCOM, Ltd., Nizhny Novgorod; Institute of Applied Physics, Nizhny Novgorod, Russia; applicators; ceramics sintering; charged ion production; functionally graded coatings; gyrotron-based millimeter-wave power sources; gyrotron-based systems; microwave plasma assisted chemical vapor deposition; millimeter-wave technologies; power control; semiconductor rapid annealing; technological microwave applications; transmission lines; Applicators; Frequency; Gyrotrons; Microwave technology; Millimeter wave technology; Physics; Power control; Power generation; Power transmission lines; Research and development;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2004.823904