Title :
Integrated Thin-Film Circuits
Author :
Maissel, L. ; Simmons, J. ; Casey, M.
Author_Institution :
IBM Corporation,N.Y.
fDate :
6/1/1961 12:00:00 AM
Abstract :
This paper describes the fabrication of microminiaturized circuitry using sputtered metals. Experiments proved that it was possible, with special techniques, to use a photosensitive resist (Kodak Metal Etch Resist) as a masking medium for the deposition of circuit components with accurate dimensions. In this instance, a single metal (tantalum) was used to form the passive components. The high sheet resistivity of stable tantalum films permits the fabrication of small resistors, while two-dimensional capacitors can be formed from anodically oxidized tantalum films. This facilitates a unfied approach to microminiaturization.
Keywords :
Conductivity; Costs; Fabrication; Integrated circuit reliability; Resistors; Resists; Sheet materials; Sputtering; Temperature; Thin film circuits;
Journal_Title :
Component Parts, IRE Transactions on
DOI :
10.1109/TCP.1961.1136596