DocumentCode :
969033
Title :
Electron-beam systems for precision micron and submicron lithography
Author :
Wilson, Alan D.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
71
Issue :
5
fYear :
1983
fDate :
5/1/1983 12:00:00 AM
Firstpage :
575
Lastpage :
584
Abstract :
This paper discusses the engineering of electron-beam systems for the generation of micron and submicron lithography. Design objectives and options for the electron-beam column, X-Y workpiece stage, laser interferometer, pattern generator, software, and general engineering are the major topics.
Keywords :
Electron beams; Electron optics; Instruments; Lithography; Optical interferometry; Optical scattering; Probes; Shape; Tungsten; Writing;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/PROC.1983.12641
Filename :
1456909
Link To Document :
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