• DocumentCode
    969274
  • Title

    Theory of dynamic behavior in atmospheric pressure arc plasma devices. I. Theory and system behavior

  • Author

    Ghorui, S. ; Das, A.K.

  • Author_Institution
    Laser & Plasma Technol. Div., Bhabha Atomic Res. Centre, Mumbai, India
  • Volume
    32
  • Issue
    1
  • fYear
    2004
  • Firstpage
    296
  • Lastpage
    307
  • Abstract
    Fluctuations in atmospheric pressure arc plasma devices play important role in plasma processing applications. A full knowledge and control over such fluctuations can effectively lengthen lifetime and drastically improve performance and reliability. Dynamical analyses of associated experimental fluctuating signals established existence of chaotic dynamics in such devices. However, the origin of such fluctuations remained unexplained so far and no theoretical investigation is carried out to explore underlying physics behind such phenomena. This work addresses development of a general theory for such fluctuations in atmospheric pressure arc plasma devices in terms of various nondimensional parameters using basic governing equations and presents the result of application of the theory to various important experiments reported in literature. Various aspects of dynamic behavior have been investigated through the study of coefficients appearing in the nonlinear amplitude equation. It has been shown that the theory supports arc current and gas flow rate as the major externally available controlling parameters in agreement with experiment. Theory exhibits period doubling route to chaos under variation of control parameter as observed experimentally. System includes catastrophic behavior for some operating range. The whole work is divided into two parts. This paper presents part I: development of theory for such fluctuations using basic equations of the dynamics and study of system behavior.
  • Keywords
    arcs (electric); chaos; plasma devices; plasma fluctuations; plasma materials processing; arc current; atmospheric pressure arc plasma devices; chaos; chaotic dynamics; dynamic behavior; fluctuations; gas flow rate; nonlinear amplitude equation; plasma processing applications; Atmospheric-pressure plasmas; Chaos; Fluctuations; Fluid flow; Nonlinear equations; Physics; Plasma applications; Plasma devices; Plasma materials processing; Signal analysis;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2004.826013
  • Filename
    1291647