DocumentCode :
970263
Title :
Properties of reactively sputtered superconducting films
Author :
Gavaler, J.R.
Author_Institution :
Westinghouse Electric Corporation, Pittsburgh, Pennsylvania
Volume :
15
Issue :
1
fYear :
1979
fDate :
1/1/1979 12:00:00 AM
Firstpage :
623
Lastpage :
624
Abstract :
A review of the applicability of reactive sputtering to the synthesis of several A15 and B1 superconductors was performed. Critical temperature, Tc, of Nb3Ge and V3Si made by this method were found to be slightly lower than the highest reported values. Tc´s of V3Ge and NbC films were higher than found in bulk samples. Nb-Si films were nonsuperconducting. The preparation of pseudo-binary alloys of the Nb-V-Ge, Nb-V-Si and the Nb-Ge-Si systems resulted in no improvements in Tc´s. Fabrication of layered structures consisting of Nb-C-N and nonsuperconducting layers was investigated.
Keywords :
Conducting films; Sputtering; Superconducting materials; Chemical elements; Gases; Germanium; Impurities; Niobium compounds; Sputtering; Substrates; Superconducting films; Superconductivity; Temperature;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1979.1060200
Filename :
1060200
Link To Document :
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