VISTA-user interface, task level, and tool integration

Author

Halama, Stefan ; Pichler, Christoph ; Rieger, Gerhard ; Schrom, Gerhard ; Simlinger, Thomas ; Selberherr, Siegfried

Author_Institution

Inst. for Microelectron., Tech. Univ. Wien, Austria

Volume

14

Issue

10

fYear

1995

fDate

10/1/1995 12:00:00 AM

Firstpage

1208

Lastpage

1222

Abstract

Succeeding an earlier paper on the data level, the Viennese Integrated System for Technology CAD Applications (VISTA), an integration and development system for Technology CAD, is presented. Starting with a short overview of TCAD methodology and existing integrated systems, portability and comprehensibility are postulated as key considerations and an application-framework architecture is proposed. The design of VISTA´s user interface and task level, presented next, adheres strictly to these guidelines. To enable the cooperation of independent simulation tools, an automatic triangulation-based service is provided by VISTA to resolve inconsistencies in wafer representations. A final example shows how three different simulators, integrated by the framework are used to simulate a planarized, trench-isolated 0.25 μm CMOS process

Keywords

CAD; semiconductor process modelling; user interfaces; 0.25 micron; VISTA; Viennese Integrated System for Technology CAD Applications; application-framework architecture; automatic triangulation; comprehensibility; development system; planarized trench-isolated CMOS process; portability; simulation; task level; tool integration; user interface; wafer representation; Application software; CMOS process; CMOS technology; Computational modeling; Delay; Design automation; Fabrication; Guidelines; Paper technology; User interfaces;

fLanguage

English

Journal_Title

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on

Publisher

ieee

ISSN

0278-0070

Type

jour

DOI

10.1109/43.466337

Filename

466337