DocumentCode
970366
Title
Ohmic contacts on n-GaAs produced by spark alloying
Author
D´angelo, R. ; Verlangieri, P.A.
Author_Institution
Bell Laboratories, Crawford Hill Laboratory, Holmdel, USA
Volume
17
Issue
8
fYear
1981
Firstpage
290
Lastpage
291
Abstract
A new method of forming ohmic contacts on n-GaAs using electroplated Sn/Au and alloying with a high frequency spark generator is described. This process gives an average contact resistance of 3.9Ã10¿6±0.2Ã10¿6 ¿cm2, which is comparable to results obtained by laser irradiation and indirect electric heating. The sparking technique produces uniform alloying of the substrate surface, while avoiding high temperatures throughout the substrate.
Keywords
III-V semiconductors; contact resistance; gallium arsenide; gold; ohmic contacts; III-V semiconductor; contact resistance; electroplated Sn/Au; high frequency spark generator; indirect electric heating; laser irradiation; n-GaAs; ohmic contacts; spark alloying;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810203
Filename
4245670
Link To Document