Title :
Effect of illumination and gate bias on flat-band voltage in plasma CVD Si-N on n-Si MIS structure
Author :
Jeong, M.U. ; Shirafuji, J. ; Inuishi, Y. ; Yakushiji, Hiroshi ; Harada, Kanako ; Oka, Hikaru
Author_Institution :
Osaka University, Department of Electrical Engineering, Faculty of Engineering, Suita, Japan
Abstract :
Remarkable effects of light illumination and/or negative gate bias on the capacitance/voltage characteristics of plasma CVD Si-N on n-Si structure are described. A qualitative model which can explain consistently the experimental results is briefly discussed.
Keywords :
CVD coatings; electronic conduction in insulating thin films; metal-insulator-semiconductor structures; photovoltaic effects; silicon compounds; capacitance voltage characteristics; electronic conduction in insulating films; flat band voltage; light illumination; model; negative gate bias;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19810311
