Sources of failures and yield improvement for VLSI and restructurable interconnects for RVLSI and WSI: Part I—Sources of failures and yield improvement for VLSI

Redundancy of both logic circuits and interconnections is the core principle of both RVLSI (Restructurable or Fault-Tolerant VLSI) and WSI (Wafer Scale Integration). For varying complexity and sizes of circuits different factors of redundancy are required. Effective use of redundancy requires understanding of the failures and failure modes at different stages of the processing and lifetime of VLSI and WSI circuits. This paper consists of two parts. In Part I, sources of failures for MOS devices are discussed. Manifestations of physical failures are described. Use of redundancy for the yield improvement of VLSI circuits is explored through the use of a mathematical model. It is shown that interconnection density and pattern complexities around each section determines the effectiveness of yield improvement. In Part II (to be published in a forthcoming issue), programmable interconnect technologies are described to facilitate restructuring of VLSI and WSI circuits, in this case as they apply to yield improvement through the use of redundancy.