DocumentCode :
972628
Title :
Room temperature CW operation of GaInAsP/InP double-heterostructure diode lasers emitting at 1.23 ¿m grown by low-pressure metalorganic chemical vapour deposition
Author :
Razeghi, M. ; Hirtz, J.P. ; Hirtz, P. ; Larivain, J.P. ; Bondeau, R. ; de Cremoux, B. ; Duchemin, J.P.
Author_Institution :
Thomson-CSF, Laboratoire Central de Recherches, Orsay, France
Volume :
17
Issue :
17
fYear :
1981
Firstpage :
597
Lastpage :
598
Abstract :
We report the first successful room-temperature CW operation of GaInAsP/InP DH lasers emitting at 1.23 ¿m grown by LP MOCVD. Current thresholds as low as 250 mA have been obtained for CW operation.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; laser transitions; semiconductor junction lasers; vapour phase epitaxial growth; 1.23 mu m; GaInAsP-InP DH diode laser; III-V semiconductors; current threshold; low-pressure metalorganic chemical vapour deposition;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19810420
Filename :
4245896
Link To Document :
بازگشت