DocumentCode
973642
Title
GaAs power MESFETs prepared by metalorganic chemical vapour deposition
Author
Shino, T. ; Yanagawa, S. ; Yamada, Y. ; Arai, K. ; Kamei, K. ; Chigira, T. ; Nakanisi, T.
Author_Institution
Toshiba Corporation, Electronics Equipment Division, Kawasaki, Japan
Volume
17
Issue
20
fYear
1981
Firstpage
738
Lastpage
739
Abstract
GaAs power MESFETs have been developed by using MOCVD wafers. The saturation current of 7.2 mm-wide MESFET chips fabricated on a 6 cm2 wafer has been found to have a standard deviation of 6.8%, which is nearly a half of that observed for MESFETs fabricated on a conventional VPE wafer of the same size. The two-chip device with a gate width of 14.4 mm delivered 4 W at 7.8 GHz with 3 dB gain. The output power of 4 W at 7.8 GHz is the state-of-the-art performance of the GaAs power MESFETs prepared by the MOCVD technique.
Keywords
III-V semiconductors; Schottky gate field effect transistors; chemical vapour deposition; gallium arsenide; power transistors; semiconductor growth; solid-state microwave devices; 4 W output power; 7.8 GHz; GaAs power MESFETs; MOCVD wafers; metalorganic chemical vapour deposition; output power; saturation current; two-chip device;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19810519
Filename
4245998
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