• DocumentCode
    973642
  • Title

    GaAs power MESFETs prepared by metalorganic chemical vapour deposition

  • Author

    Shino, T. ; Yanagawa, S. ; Yamada, Y. ; Arai, K. ; Kamei, K. ; Chigira, T. ; Nakanisi, T.

  • Author_Institution
    Toshiba Corporation, Electronics Equipment Division, Kawasaki, Japan
  • Volume
    17
  • Issue
    20
  • fYear
    1981
  • Firstpage
    738
  • Lastpage
    739
  • Abstract
    GaAs power MESFETs have been developed by using MOCVD wafers. The saturation current of 7.2 mm-wide MESFET chips fabricated on a 6 cm2 wafer has been found to have a standard deviation of 6.8%, which is nearly a half of that observed for MESFETs fabricated on a conventional VPE wafer of the same size. The two-chip device with a gate width of 14.4 mm delivered 4 W at 7.8 GHz with 3 dB gain. The output power of 4 W at 7.8 GHz is the state-of-the-art performance of the GaAs power MESFETs prepared by the MOCVD technique.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; chemical vapour deposition; gallium arsenide; power transistors; semiconductor growth; solid-state microwave devices; 4 W output power; 7.8 GHz; GaAs power MESFETs; MOCVD wafers; metalorganic chemical vapour deposition; output power; saturation current; two-chip device;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19810519
  • Filename
    4245998