DocumentCode :
974095
Title :
Construction and Electrical Properties of a Germanium Alloy-Diffused Transistor
Author :
Jochems, P.J.W. ; Memelink, O.W. ; Tummers, L.J.
Author_Institution :
Philips Res. Labs., N. V. Philips´´ Gloeilampenfabrieken, Eindhoven, Netherlands
Volume :
46
Issue :
6
fYear :
1958
fDate :
6/1/1958 12:00:00 AM
Firstpage :
1161
Lastpage :
1165
Abstract :
The fabrication of high-frequency transistors by the alloy-diffusion method is described. A group of transistors was subjected to an extensive series of measurements in order to establish an equivalent circuit characterizing the transistor for small ac amplitudes at à fixed dc bias. The resulting "physical" T-equivalent circuit is valid up to at least 25 mc. The different circuit elements are discussed with respect to their physical background. A translation from the T-circuit into the electrically more convenient ¿-circuit is also presented.
Keywords :
Alloying; Aluminum alloys; Equivalent circuits; Fabrication; Frequency; Germanium alloys; Manufacturing; Solids; Temperature; Thickness control;
fLanguage :
English
Journal_Title :
Proceedings of the IRE
Publisher :
ieee
ISSN :
0096-8390
Type :
jour
DOI :
10.1109/JRPROC.1958.286898
Filename :
4065457
Link To Document :
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