• DocumentCode
    974375
  • Title

    Design and Fabrication of 4H-SiC RF MOSFETs

  • Author

    Gudjónsson, Gudjón I. ; Allerstam, Fredrik ; Sveinbjörnsson, Einar Ö ; Hjelmgren, Hans ; Nilsson, Per-Åke ; Andersson, Kristoffer ; Zirath, Herbert ; Rödle, Thomas ; Jos, Rik

  • Author_Institution
    Chalmers Univ. of Technol., Goteberg
  • Volume
    54
  • Issue
    12
  • fYear
    2007
  • Firstpage
    3138
  • Lastpage
    3145
  • Abstract
    We present simulations, fabrication and analysis of 4H-SiC RF power MOSFETs. We obtain an extrinsic transition frequency of 11.2 GHz and an /max = 11.9 GHz, a breakdown voltage above 200 V and an output power of 1.9 W/mm at 3 GHz. The measured devices are double fingered, source-gate-drain-gate-source with 2times0.4 mm total gate width and the nominal channel length of the devices is 0.5 mum. To the authors knowledge, this is the highest transition frequency and output power density ever reported for SiC RF MOSFETs. The antipunch through is introduced as a way to take advantage of the SiC´s material properties. A detailed description of the device processing is also given.
  • Keywords
    III-V semiconductors; MOSFET; silicon compounds; wide band gap semiconductors; 4H-SiC RF MOSFET; antipunchthrough; breakdown voltage; device processing; extrinsic transition frequency; output power density; source-gate-drain-gate-source; Doping; Fabrication; Geometry; Interface states; MOSFETs; Power amplifiers; Power generation; Radio frequency; Silicon carbide; Threshold voltage; HF amplifiers; MOSFETs; power MOSFETs; silicon carbide;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2007.908547
  • Filename
    4383029