DocumentCode
974375
Title
Design and Fabrication of 4H-SiC RF MOSFETs
Author
Gudjónsson, Gudjón I. ; Allerstam, Fredrik ; Sveinbjörnsson, Einar Ö ; Hjelmgren, Hans ; Nilsson, Per-Åke ; Andersson, Kristoffer ; Zirath, Herbert ; Rödle, Thomas ; Jos, Rik
Author_Institution
Chalmers Univ. of Technol., Goteberg
Volume
54
Issue
12
fYear
2007
Firstpage
3138
Lastpage
3145
Abstract
We present simulations, fabrication and analysis of 4H-SiC RF power MOSFETs. We obtain an extrinsic transition frequency of 11.2 GHz and an /max = 11.9 GHz, a breakdown voltage above 200 V and an output power of 1.9 W/mm at 3 GHz. The measured devices are double fingered, source-gate-drain-gate-source with 2times0.4 mm total gate width and the nominal channel length of the devices is 0.5 mum. To the authors knowledge, this is the highest transition frequency and output power density ever reported for SiC RF MOSFETs. The antipunch through is introduced as a way to take advantage of the SiC´s material properties. A detailed description of the device processing is also given.
Keywords
III-V semiconductors; MOSFET; silicon compounds; wide band gap semiconductors; 4H-SiC RF MOSFET; antipunchthrough; breakdown voltage; device processing; extrinsic transition frequency; output power density; source-gate-drain-gate-source; Doping; Fabrication; Geometry; Interface states; MOSFETs; Power amplifiers; Power generation; Radio frequency; Silicon carbide; Threshold voltage; HF amplifiers; MOSFETs; power MOSFETs; silicon carbide;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2007.908547
Filename
4383029
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