Title :
Gate Injection Transistor (GIT)—A Normally-Off AlGaN/GaN Power Transistor Using Conductivity Modulation
Author :
Uemoto, Yasuhiro ; Hikita, Masahiro ; Ueno, Vivek ; Matsuo, Hisayoshi ; Ishida, Hidetoshi ; Yanagihara, Manabu ; Ueda, Tetsuzo ; Tanaka, Tsuyoshi ; Ueda, Daisuke
Author_Institution :
Semicond. Device Res. Center Ltd., Kyoto
Abstract :
We have developed a normally-off GaN-based transistor using conductivity modulation, which we call a gate injection transistor (GIT). This new device principle utilizes hole-injection from the p-AlGaN to the AlGaN/GaN heterojunction, which simultaneously increases the electron density in the channel, resulting in a dramatic increase of the drain current owing to the conductivity modulation. The fabricated GIT exhibits a threshold voltage of 1.0 V with a maximum drain current of 200 mA/mm, in which a forward gate voltage of up to 6 V can be applied. The obtained specific ON-state resistance (RON . A) and the OFF-state breakdown voltage (BV ds) are 2.6 mOmega . cm2 and 800 V, respectively. The developed GIT is advantageous for power switching applications.
Keywords :
III-V semiconductors; aluminium compounds; electric breakdown; gallium compounds; power transistors; wide band gap semiconductors; AlGaN - Interface; breakdown voltage; conductivity modulation; drain current; electron density; forward gate voltage; gate injection transistor; hole-injection; normally-off power transistor; on-state resistance; power switching applications; voltage 1.0 V; voltage 800 V; Aluminum gallium nitride; Conductivity; FETs; Gallium nitride; HEMTs; Insulated gate bipolar transistors; MODFETs; MOSFETs; Power transistors; Threshold voltage; Conductivity modulation; GaN; Si substrate; high breakdown voltage; high power switching device; hole injection; low specific ON-state resistance; normally off;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2007.908601