DocumentCode :
975074
Title :
Current drifting behaviour in InP MISFET with thermally oxidised InP/InP interface
Author :
Okamura, M. ; Kobayashi, Takehiko
Author_Institution :
NTT, Musashino Electrical Communication Laboratory, Musashino, Japan
Volume :
17
Issue :
25
fYear :
1981
Firstpage :
941
Lastpage :
942
Abstract :
Inversion-mode InP MISFETs with a thermally oxidised InP/InP interface have been fabricated. The devices exhibit fairly stabilised drain-current/time characteristics compared with those of the conventional devices reported so far. The MIS interface properties are also discussed.
Keywords :
III-V semiconductors; indium compounds; insulated gate field effect transistors; III-V semiconductors; InP MISFET; current drifting behaviour; drain-current/time characteristics; interface properties; thermally oxidised InP/InP interface;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19810658
Filename :
4246142
Link To Document :
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