DocumentCode :
975380
Title :
Thermally Stable Mirror Structures for Vertical-Conducting GaN/Mirror/Si Light-Emitting Diodes
Author :
Huang, Shao-Hua ; Horng, Ray-Hua ; Li, Szu-Lung ; Yen, Kuo-Wei ; Wuu, Dong-Sing ; Lin, Chao-Kun ; Liu, Heng
Author_Institution :
Nat. Chung Hsing Univ., Taichung
Volume :
19
Issue :
23
fYear :
2007
Firstpage :
1913
Lastpage :
1915
Abstract :
Vertical-conducting GaN/mirror/Si light-emitting diodes (LEDs) with thermally stable mirrors have been fabricated using a combination of wafer-bonding and laser liftoff techniques. The thermal stabilities of NiO-Ag, NiO-Ag-Ni, and NiO-Au-Ag mirrors and their effects on the performance of mirror-substrate LEDs were studied. It is found that the NiO-Ag-Ni mirror presents the best performance, where the specific contact resistance and the reflectivity can achieve 5.1times10-3 Omega-cm2 and 92% at 470 nm after oxidation annealing at 500degC for 10 min. The top Ni layer could protect the Ag mirror from clustering during the thermal treatment process. The output powers of the GaN-sapphire and GaN/mirror/Si LEDs with NiO-Au-Ag and NiO-Ag-Ni mirrors show 4.5, 4.3, and 13 mW, respectively.
Keywords :
III-V semiconductors; annealing; elemental semiconductors; gallium compounds; light emitting diodes; oxidation; silicon; GaN-Si; oxidation annealing; reflectivity; temperature 500 degC; thermal stabilities; thermally stable mirror structures; vertical-conducting light-emitting diodes; wafer-bonding; Annealing; Contact resistance; Gallium nitride; Laser stability; Light emitting diodes; Mirrors; Oxidation; Protection; Reflectivity; Thermal stability; GaN; laser liftoff; light-emitting diode (LED); thermally stable mirror; wafer bonding;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2007.908352
Filename :
4383192
Link To Document :
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