• DocumentCode
    975459
  • Title

    New preparation process for sputtered γ-Fe2O3thin film disks

  • Author

    Ishii, Y. ; Terada, A. ; Ishii, O. ; Ohta, S. ; Hattori, S. ; Makino, K.

  • Author_Institution
    N.T.T., Tokyo, Japan
  • Volume
    16
  • Issue
    5
  • fYear
    1980
  • fDate
    9/1/1980 12:00:00 AM
  • Firstpage
    1114
  • Lastpage
    1116
  • Abstract
    A new preparation process for sputtered γ-Fe2O3thin film disks has been developed. The new process is composed of Fe3O4film formation by reactive sputtering and oxidation to γ-Fe2O3film. The characteristic of the process is that the Fe3O4single phase film is formed directly by reactive sputtering of an Fe-alloy target in Ar-O2atmosphere. The magnetic properties and recording results of the newly developed γ-Fe2O3thin films were almost equal to those of the reported sputtered films. Recording density D50reached 1,100 bits/mm.
  • Keywords
    Magnetic disk recording; Sputtering; Coercive force; Disk recording; Electrodes; Electrons; Laboratories; Magnetic films; Magnetic properties; Magnetic recording; Oxidation; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1980.1060660
  • Filename
    1060660
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=975459