DocumentCode :
975705
Title :
Criteria for setting the width of CCD front end transistor to reach minimum pixel noise
Author :
Fasoli, Luca ; Sampietro, Marco
Author_Institution :
Dipartimento di Elettronica e Inf., Politecnico di Milano, Italy
Volume :
43
Issue :
7
fYear :
1996
fDate :
7/1/1996 12:00:00 AM
Firstpage :
1073
Lastpage :
1076
Abstract :
The paper gives the criteria to calculate the width of the front end transistor integrated next to the charge sensing electrode of CCDs or, in general, of semiconductor detectors, in order to reach the minimum noise in the readout of the signal charge. It accounts for white, series and parallel, and 1/f noise contributions. In addition, it points out two different design criteria depending whether a JFET or a MOSFET is used. The attention given to the JFET is due to a lower 1/f noise component, which makes these transistors more appealing as input devices in very high resolution detectors. The paper shows that there is a characteristic width of the FET gate that practically does not depend on the noise sources but depends only on the capacitance seen by the charge sensing electrode of the detector, making possible the optimum design of the transistor prior to knowledge of the real values of the spectral density of the noise sources, which are usually precisely known only at the end of the fabrication process. The paper shows that the pixel noise raises sharply as the transistor gate width departs from its optimum value
Keywords :
1/f noise; CCD image sensors; MOSFET; junction gate field effect transistors; semiconductor device noise; silicon radiation detectors; white noise; 1/f noise; CCD front end transistor width; FET gate characteristic width; JFET; MOSFET; charge sensing electrode; design criteria; minimum pixel noise; noise source spectral density; parallel noise; semiconductor detectors; series noise; signal charge readout noise; transistor gate width; very high resolution detectors; white noise; Capacitance; Charge coupled devices; Detectors; Electrodes; Electrons; Fabrication; MOSFETs; Semiconductor device noise; Signal processing; White noise;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.502417
Filename :
502417
Link To Document :
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