Title :
Low thermal budget processing of organic dielectrics
Author :
Sharangpani, R. ; Cherukuri, K.C. ; Singh, R.
Author_Institution :
Dept. of Electr. & Comput. Eng., Clemson Univ., SC, USA
fDate :
7/1/1996 12:00:00 AM
Abstract :
Low dielectric constant organic materials are ideal for use as interconnect dielectrics for integrated circuits (ICs) to reduce power dissipation, crosstalk and RC delays. For high performance and reliability of ICs, reduced thermal and intrinsic stress is highly desirable. Low thermal budget rapid isothermal processing (RIP) can provide materials with lower stress. In this paper, we demonstrate the role of photoeffects in the curing of polyimide films using a rapid isothermal processor as a source of optical and thermal energy. The availability of large a number of ultraviolet and vacuum ultraviolet photons on the film surface allowed a lower curing temperature and also resulted in the lowest leakage current and film stress. We demonstrate a direct one-to-one correlation between electrical, mechanical, and structural properties of the organic dielectrics
Keywords :
dielectric thin films; internal stresses; leakage currents; polymer films; rapid thermal processing; thermal stresses; curing; dielectric constant; electrical properties; integrated circuit interconnects; intrinsic stress; leakage current; mechanical properties; organic dielectrics; polyimide films; rapid isothermal processing; structural properties; thermal budget; thermal stress; ultraviolet photoeffect; vacuum ultraviolet photoeffect; Crosstalk; Curing; Dielectric constant; Integrated circuit interconnections; Isothermal processes; Optical films; Organic materials; Power dissipation; Rapid thermal processing; Thermal stresses;
Journal_Title :
Electron Devices, IEEE Transactions on