DocumentCode
975858
Title
Low thermal budget processing of organic dielectrics
Author
Sharangpani, R. ; Cherukuri, K.C. ; Singh, R.
Author_Institution
Dept. of Electr. & Comput. Eng., Clemson Univ., SC, USA
Volume
43
Issue
7
fYear
1996
fDate
7/1/1996 12:00:00 AM
Firstpage
1168
Lastpage
1170
Abstract
Low dielectric constant organic materials are ideal for use as interconnect dielectrics for integrated circuits (ICs) to reduce power dissipation, crosstalk and RC delays. For high performance and reliability of ICs, reduced thermal and intrinsic stress is highly desirable. Low thermal budget rapid isothermal processing (RIP) can provide materials with lower stress. In this paper, we demonstrate the role of photoeffects in the curing of polyimide films using a rapid isothermal processor as a source of optical and thermal energy. The availability of large a number of ultraviolet and vacuum ultraviolet photons on the film surface allowed a lower curing temperature and also resulted in the lowest leakage current and film stress. We demonstrate a direct one-to-one correlation between electrical, mechanical, and structural properties of the organic dielectrics
Keywords
dielectric thin films; internal stresses; leakage currents; polymer films; rapid thermal processing; thermal stresses; curing; dielectric constant; electrical properties; integrated circuit interconnects; intrinsic stress; leakage current; mechanical properties; organic dielectrics; polyimide films; rapid isothermal processing; structural properties; thermal budget; thermal stress; ultraviolet photoeffect; vacuum ultraviolet photoeffect; Crosstalk; Curing; Dielectric constant; Integrated circuit interconnections; Isothermal processes; Optical films; Organic materials; Power dissipation; Rapid thermal processing; Thermal stresses;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.502430
Filename
502430
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