DocumentCode
975928
Title
Crystal defects and characteristics of YGaIG single crystal grown by the float zone method
Author
Torii, M. ; Kihara, U. ; Goto, H. ; Yuri, H.
Author_Institution
Fuji Electrochemical Company Ltd., Shizuoka, Japan
Volume
16
Issue
5
fYear
1980
fDate
9/1/1980 12:00:00 AM
Firstpage
678
Lastpage
680
Abstract
It was revealed that the YGaIG single crystal grown by the FZ method shows an etch pit pattern caused by crystal defects different from that obtained by flux method. To reduce such crystal defects, various experiments as parameters of crystallizing conditions have been studied. These experimental results revealed that crystal defects of etch pit density of less thatn 102pcs.cm-2is obtained at the core region of the crystal by decreasing the crystal defects inherent to FZ method and by expanding the core region. As for microwave characteristics a narrow ΔH and a few mode change resonator has been developed.
Keywords
Crystal defects; Defects in crystals; YIG materials/devices; Chemicals; Crystallization; Etching; Filters; Magnetic resonance; Microwave theory and techniques; Paramagnetic resonance; Phase measurement; Sampling methods; Solvents;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1980.1060702
Filename
1060702
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