DocumentCode :
976891
Title :
Secondary electron yield measurements from materials with application to collectors of high-power microwave devices
Author :
Zameroski, Nathan D. ; Kumar, Prashanth ; Watts, Christopher ; Svimonishvili, Tengiz ; Gilmore, Mark ; Schamiloglu, Edl ; Gaudet, John A.
Volume :
34
Issue :
3
fYear :
2006
fDate :
6/1/2006 12:00:00 AM
Firstpage :
642
Lastpage :
651
Abstract :
An experimental test facility has been established for measuring the secondary electron yield (SEY) of materials thought to be suitable for low yield vacuum electronic applications such as collectors in high-power microwave (HPM) tubes. Experiments can be broadly divided into two energy-regimes: a high-energy (1-50 keV) and a low-energy (10 eV-1 keV) regime. Measurements of SEY at high energies are presented for the following materials: copper, titanium, and Poco graphite. Observation of time-dependent SEY behavior in these samples suggests that surface processes play an important role during measurements. In addition, SEY at low energies and as a function of the angle of incidence of primary electrons has been measured for plasma sprayed boron carbide (PSBC). The experimental results presented here are benchmarked with existing SEY data in the literature, empirically and to first principle formulae
Keywords :
copper; graphite; microwave generation; microwave tubes; secondary electron emission; titanium; 0.01 to 50 keV; C; Cu; Poco graphite; Ti; collectors; high-power microwave devices; incidence angle; microwave tubes; plasma sprayed boron carbide; secondary electron yield; vacuum electronic applications; Copper; Electron tubes; Energy measurement; Microwave devices; Microwave measurements; Plasma materials processing; Plasma measurements; Test facilities; Thermal spraying; Titanium; Collectors; depressed collectors; high-power microwaves (HPMs); secondary electron yield (SEY); secondary electrons;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2006.875778
Filename :
1643286
Link To Document :
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