• DocumentCode
    977054
  • Title

    InGaAs-InP mesa DHBTs with simultaneously high f/sub /spl tau// and fmax and low C/sub cb//I/sub c/ ratio

  • Author

    Griffith, Z. ; Dahlstrom, M. ; Urteaga, M. ; Rodwell, M.J.W. ; Fang, X.-M. ; Lubyshev, D. ; Wu, Yaowu ; Fastenau, J.M. ; Liu, W.K.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of California, Santa Barbara, CA, USA
  • Volume
    25
  • Issue
    5
  • fYear
    2004
  • fDate
    5/1/2004 12:00:00 AM
  • Firstpage
    250
  • Lastpage
    252
  • Abstract
    We report an InP-InGaAs-InP double heterojunction bipolar transistor (DHBT), fabricated using a conventional triple mesa structure, exhibiting a 370-GHz f/sub /spl tau// and 459-GHz fmax, which is to our knowledge the highest f/sub /spl tau// reported for a mesa InP DHBT-as well as the highest simultaneous f/sub /spl tau// and fmax for any mesa HBT. The collector semiconductor was undercut to reduce the base-collector capacitance, producing a C/sub cb//I/sub c/ ratio of 0.28 ps/V at V/sub cb/=0.5 V. The V/sub BR,CEO/ is 5.6 V and the devices fail thermally only at >18 mW/μm2, allowing dc bias from J/sub e/=4.8 mA/μm2 at V/sub ce/=3.9 V to J/sub e/=12.5 mA/μm2 at V/sub ce/=1.5 V. The device employs a 30 nm carbon-doped InGaAs base with graded base doping, and an InGaAs-InAlAs superlattice grade in the base-collector junction that contributes to a total depleted collector thickness of 150 nm.
  • Keywords
    III-V semiconductors; capacitance; doping profiles; heterojunction bipolar transistors; semiconductor superlattices; 0.5 V; 1.5 V; 150 nm; 3.9 V; 30 nm; 370 GHz; 459 GHz; 5.6 V; C/sub cb//I/sub c/ ratio; InGaAs-InAlAs; InP-InGaAs-InP; base-collector capacitance; base-collector junction; carbon-doped InGaAs base; collector semiconductor; conventional triple mesa structure; double heterojunction bipolar transistor; graded base doping; superlattice grade; total depleted collector thickness; Current density; DH-HEMTs; Delay; Digital circuits; Doping; Double heterojunction bipolar transistors; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Parasitic capacitance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2004.827288
  • Filename
    1295097