DocumentCode
977996
Title
Amorphous silicon TFT capacitance model using an effective temperature approach
Author
Kuo, J.B. ; Chen, S.S.
Author_Institution
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume
29
Issue
24
fYear
1993
Firstpage
2151
Lastpage
2152
Abstract
An analytical capacitance model for a-Si:H thin film transistors, that considers deep and tail states simultaneously, is presented. Using an effective temperature approach and a charge-oriented concept, the localised deep and tail states have been considered in the capacitance model. As verified by the published data, this analytical capacitance model provides an accurate prediction of the C-V characteristics of an a-Si:H thin film transistor.
Keywords
amorphous semiconductors; capacitance; deep levels; elemental semiconductors; equivalent circuits; hydrogen; insulated gate field effect transistors; semiconductor device models; silicon; thin film transistors; C-V characteristics; Si:H; TFT capacitance model; a-Si:H; charge-oriented concept; deep states; effective temperature approach; tail states; thin film transistors;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19931438
Filename
247628
Link To Document