• DocumentCode
    977996
  • Title

    Amorphous silicon TFT capacitance model using an effective temperature approach

  • Author

    Kuo, J.B. ; Chen, S.S.

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • Volume
    29
  • Issue
    24
  • fYear
    1993
  • Firstpage
    2151
  • Lastpage
    2152
  • Abstract
    An analytical capacitance model for a-Si:H thin film transistors, that considers deep and tail states simultaneously, is presented. Using an effective temperature approach and a charge-oriented concept, the localised deep and tail states have been considered in the capacitance model. As verified by the published data, this analytical capacitance model provides an accurate prediction of the C-V characteristics of an a-Si:H thin film transistor.
  • Keywords
    amorphous semiconductors; capacitance; deep levels; elemental semiconductors; equivalent circuits; hydrogen; insulated gate field effect transistors; semiconductor device models; silicon; thin film transistors; C-V characteristics; Si:H; TFT capacitance model; a-Si:H; charge-oriented concept; deep states; effective temperature approach; tail states; thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19931438
  • Filename
    247628