DocumentCode :
978005
Title :
Cryogenic investigation of gate leakage and RF performances down to 50K of 0.2 mu m AlInAs/GaInAs/InP HEMTs
Author :
Sylvestre, A. ; Crozat, P. ; Adde, R. ; de Lustrac, Andre ; Jin, Yichao ; Harmand, J.C. ; Quillec, M.
Author_Institution :
Inst. d´Electronique Fondamentale, Univ. de Paris-Sud, Orsay, France
Volume :
29
Issue :
24
fYear :
1993
Firstpage :
2152
Lastpage :
2154
Abstract :
0.2 mu m Al0.48In0.52As/Ga0.47In0.53As LMHEMT on InP with an undoped GaInAs layer to reduce gate leakage have been realised and their DC and RF properties have been investigated at cryogenic temperatures. The cutoff maximum frequencies of oscillation Fmax up to 260 GHz are extrapolated at 50K from the maximum unilateral gain (MUG) determined using S-parameters measured up to 40 GHz, Evolution of gate leakage current and RF characteristics against gate and drain biases are presented between 50 and 300K.
Keywords :
III-V semiconductors; S-parameters; aluminium compounds; cryogenics; gallium arsenide; high electron mobility transistors; indium compounds; leakage currents; solid-state microwave devices; 0 to 260 GHz; 0.2 micron; 50 to 300 K; Al 0.48In 0.52As-Ga 0.47In 0.53As-InP; AlInAs/GaInAs/InP HEMTs; DC performance; InP; LMHEMT; RF performances; S-parameters; cryogenic temperatures; cutoff frequency; gate leakage; maximum unilateral gain; microwave device; undoped GaInAs layer;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19931439
Filename :
247629
Link To Document :
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