Optimisation of borophosphosilicate glass compositions for silica-on-silicon integrated optical circuits fabricated by the sol-gel process

Author

Syms, R.R.A. ; Huang, W. ; Schneider, V.M.

Author_Institution

Dept. of Electr. & Electron. Eng., Imperial Coll. of Sci., Technol. & Med., London, UK

Volume

32

Issue

13

fYear

1996

fDate

6/20/1996 12:00:00 AM

Firstpage

1233

Lastpage

1234

Abstract

Silica-on-silicon channel guide devices fabricated in sol-gel borophosphosilicate glass deposited by repetitive spin-coating and rapid thermal annealing (SC-RTA) are described. Process parameters for a wide range of glass compositions are given. The optimum performance is obtained using a borosilicate buffer layer, a phosphosilicate core and a borophosphosilicate cladding with a low melting point. Low-loss thermo-optic interferometric modulators fabricated by this process are described

Keywords

borosilicate glasses; integrated optics; optical fabrication; optical glass; phosphosilicate glasses; rapid thermal annealing; silicon compounds; sol-gel processing; B2O3-P2O5-SiO2; BPSG; SiO₂-Si; borophosphosilicate glass composition; fabrication; integrated optical circuit; optimisation; rapid thermal annealing; silica-on-silicon channel guide device; sol-gel process; spin coating; thermo-optic interferometric modulator;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el:19960787

Filename

503023