• DocumentCode
    979137
  • Title

    Comparison study of tunneling models for Schottky field effect transistors and the effect of Schottky barrier lowering

  • Author

    Vega, Reinaldo A.

  • Author_Institution
    Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY
  • Volume
    53
  • Issue
    7
  • fYear
    2006
  • fDate
    7/1/2006 12:00:00 AM
  • Firstpage
    1593
  • Lastpage
    1600
  • Abstract
    An Airy function transfer matrix tunneling model and the Wentzel-Kramers-Brillouin (WKB) tunneling model have been compared in the application to Schottky field effect transistors (SFETs) with and without the incorporation of Schottky barrier lowering (SBL). Model calculations have shown that the WKB model can predict tunneling current through a Schottky barrier with reasonable accuracy when SBL is excluded. It is also shown that the WKB model can mimic the total current behavior in an SFET when SBL is included and when thermal current is excluded. In both cases, though, the actual physical behavior of the SFET is misrepresented, and so it is finally shown that in the design cases of interest (low Schottky barrier heights), thermal current dominates the total on-state current in SFETs
  • Keywords
    Schottky barriers; Schottky gate field effect transistors; semiconductor device models; transfer function matrices; Airy function transfer matrix; SFET; Schottky barrier lowering; Schottky field effect transistors; WKB model; Wentzel-Kramers-Brillouin model; current behavior; physical behavior; semiconductor device modeling; thermal current; tunneling current; tunneling models; CMOS technology; Equations; FETs; Microelectronics; Nanotechnology; Predictive models; Schottky barriers; Semiconductor device modeling; Tunneling; Voltage; Airy function; Schottky barrier; Wentzel–Kramers–Brillouin (WKB) method; ambipolar; metallic source/drain (S/D); nanotechnology; semiconductor device modeling; tunneling model;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2006.876261
  • Filename
    1643492