DocumentCode :
979137
Title :
Comparison study of tunneling models for Schottky field effect transistors and the effect of Schottky barrier lowering
Author :
Vega, Reinaldo A.
Author_Institution :
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY
Volume :
53
Issue :
7
fYear :
2006
fDate :
7/1/2006 12:00:00 AM
Firstpage :
1593
Lastpage :
1600
Abstract :
An Airy function transfer matrix tunneling model and the Wentzel-Kramers-Brillouin (WKB) tunneling model have been compared in the application to Schottky field effect transistors (SFETs) with and without the incorporation of Schottky barrier lowering (SBL). Model calculations have shown that the WKB model can predict tunneling current through a Schottky barrier with reasonable accuracy when SBL is excluded. It is also shown that the WKB model can mimic the total current behavior in an SFET when SBL is included and when thermal current is excluded. In both cases, though, the actual physical behavior of the SFET is misrepresented, and so it is finally shown that in the design cases of interest (low Schottky barrier heights), thermal current dominates the total on-state current in SFETs
Keywords :
Schottky barriers; Schottky gate field effect transistors; semiconductor device models; transfer function matrices; Airy function transfer matrix; SFET; Schottky barrier lowering; Schottky field effect transistors; WKB model; Wentzel-Kramers-Brillouin model; current behavior; physical behavior; semiconductor device modeling; thermal current; tunneling current; tunneling models; CMOS technology; Equations; FETs; Microelectronics; Nanotechnology; Predictive models; Schottky barriers; Semiconductor device modeling; Tunneling; Voltage; Airy function; Schottky barrier; Wentzel–Kramers–Brillouin (WKB) method; ambipolar; metallic source/drain (S/D); nanotechnology; semiconductor device modeling; tunneling model;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.876261
Filename :
1643492
Link To Document :
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