DocumentCode :
979196
Title :
On the physical understanding of the kT-layer concept in quasi-ballistic regime of transport in nanoscale devices
Author :
Clerc, Raphaël ; Palestri, Pierpaolo ; Selmi, Luca
Author_Institution :
IMEP, Grenoble
Volume :
53
Issue :
7
fYear :
2006
fDate :
7/1/2006 12:00:00 AM
Firstpage :
1634
Lastpage :
1640
Abstract :
The aim of this paper is to establish a well-defined theoretical background in which the kT-layer concept and the empirical expression of the backscattering coefficient introduced by Lundstrom and co-workers to describe the role of scattering in nanoscale devices under high-field conditions and quasi-ballistic transport regime are derived analytically. To this purpose, one-dimensional (1-D) Boltzmann transport equation is solved in the framework of a "relaxation length" approximation, leading to a set of drift-diffusion like transport equations. This set of equations is then solved in a template 1-D structure (with a linear potential energy profile), leading to an analytical expression for the backscattering coefficient, which is equal, in the limit of low- and high-electric fields, to the formulas proposed by Lundstrom This approach allows us to identify the exact assumptions and qualitative validity limits of these formulas
Keywords :
Boltzmann equation; MOSFET; approximation theory; ballistic transport; nanoelectronics; semiconductor device models; Boltzmann transport equation; MOSFET device; backscattering coefficient; high-field conditions; kT-layer concept; nanoscale devices; nanoscale transport; quasi-ballistic transport; relaxation length approximation; Backscatter; Boltzmann equation; CMOS technology; Educational technology; Helium; MOSFET circuits; Nanoscale devices; Numerical simulation; Scattering; Silicon devices; Ballistic transport; Boltzmann-transportequation; MOSFET; nanoscale transport;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.876387
Filename :
1643497
Link To Document :
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