Title :
Optimized overlay metrology marks: theory and experiment
Author :
Adel, Mike ; Ghinovker, Mark ; Golovanevsky, Boris ; Izikson, Pavel ; Kassel, Elyakim ; Yaffe, Dan ; Bruckstein, Alfred M. ; Goldenberg, Roman ; Rubner, Yossi ; Rudzsky, Michael
Author_Institution :
Opt. Metrol. Div., Migdal HaEmek, Israel
fDate :
5/1/2004 12:00:00 AM
Abstract :
In this paper, we provide a detailed analysis of overlay metrology mark and find the mapping between various properties of mark patterns and the expected dynamic precision and fidelity of measurements. We formulate the optimality criteria and suggest an optimal overlay mark design in the sense of minimizing the Cramer-Rao lower bound on the estimation error. Based on the developed theoretical results, a new overlay mark family is proposed-the grating marks. A thorough testing performed on the new grating marks shows a strong correlation with the underlying theory and demonstrate the superior quality of the new design over the overlay patterns used today.
Keywords :
integrated circuit manufacture; integrated circuit measurement; semiconductor device manufacture; semiconductor device measurement; spatial variables measurement; Cramer-Rao lower bound; dynamic precision; grating marks; mark patterns; minimizing sense; optimal overlay mark design; optimized overlay metrology mark; Estimation error; Gratings; Lithography; Manufacturing; Metrology; Microelectronics; Pattern analysis; Performance evaluation; Semiconductor device modeling; Testing; Box-in-box marks; Cramer–Rao lower bound; Fisher information matrix; dynamic precision; grating marks; overlay mark; overlay mark fidelity; overlay metrology;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2004.826955
