DocumentCode
980935
Title
Experimental Investigation of RF Noise Performance Improvement in Graded-Channel MOSFETs
Author
Emam, Mostafa ; Sakalas, Paulius ; Vanhoenacker-Janvier, Danielle ; Raskin, Jean-Pierre ; Lim, Tao Chuan ; Danneville, François
Author_Institution
Microwave Lab., Univ. Catholique de Louvain, Louvain-la-Neuve
Volume
56
Issue
7
fYear
2009
fDate
7/1/2009 12:00:00 AM
Firstpage
1516
Lastpage
1522
Abstract
In this paper, measured RF noise performance of graded-channel metal-oxide-semiconductor (MOS) transistors (GCMOS - also named laterally asymmetric channel transistors) shows impressive reduction in minimum noise figure (NF min) as compared to classical MOSFET transistors (with the same gate length Lg = 0.5 mum). The reason is proven to be because of the higher noise correlation coefficient (C). GCMOS also shows lower sensitivity to extrinsic thermal noise as compared to classical MOSFET. Moreover, it is demonstrated that the use of 0.5- mum-gate-length GCMOS gives a competitive RF noise performance as compared to 0.25-mum-gate-length classical nMOS transistors.
Keywords
MOSFET; semiconductor device measurement; semiconductor device noise; thermal noise; RF noise performance; correlation coefficient; graded-channel MOSFET; graded-channel metal-oxide-semiconductor transistor; laterally asymmetric channel transistor; nMOS transistor; size 0.5 mum; thermal noise; transition frequency; Cutoff frequency; FETs; Laboratories; Length measurement; MOSFETs; Noise figure; Noise measurement; Radio frequency; Semiconductor device noise; Transconductance; Graded-channel metal–oxide–semiconductor (GCMOS); minimum noise figure; noise correlation coefficient; silicon-on-insulator (SOI); transition frequency $(f_{T})$ ;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2009.2021361
Filename
5033308
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