DocumentCode
981117
Title
Numerical band-to-band tunnelling model for radio-frequency silicon tunnel diode with negative-differential resistance
Author
Kim, Kyung Rok ; Park, Byung-Gook ; Dutton, R.W.
Author_Institution
Center for Integrated Syst. (CIS), Stanford Univ., Stanford, CA
Volume
44
Issue
23
fYear
2008
Firstpage
1379
Lastpage
1381
Abstract
The low resistive band-to-band tunnelling (BTBT) model has been developed for radio-frequency (RF) silicon negative differential resistance (NDR) device simulation on the TCAD platform. The BTBT mechanism in a forward-biased tunnel junction is modelled based on a generation-recombination term in a continuity equation by considering a spatially varying electric field through the tunnelling distance. Using this model, DC/AC characteristics of silicon NDR devices have been successfully described on a numerical device simulation platform. The calculated speed index from the junction capacitance and peak tunnelling current of the tunnel diode shows good agreement with experiments.
Keywords
capacitance; elemental semiconductors; semiconductor device models; silicon; tunnel diodes; Si; forward-biased tunnel junction; generation-recombination term; junction capacitance; low resistive band-to-band tunnelling model; negative-differential resistance; numerical device simulation platform; radio-frequency silicon tunnel diode; tunnelling current; tunnelling distance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20082737
Filename
4668414
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