• DocumentCode
    981117
  • Title

    Numerical band-to-band tunnelling model for radio-frequency silicon tunnel diode with negative-differential resistance

  • Author

    Kim, Kyung Rok ; Park, Byung-Gook ; Dutton, R.W.

  • Author_Institution
    Center for Integrated Syst. (CIS), Stanford Univ., Stanford, CA
  • Volume
    44
  • Issue
    23
  • fYear
    2008
  • Firstpage
    1379
  • Lastpage
    1381
  • Abstract
    The low resistive band-to-band tunnelling (BTBT) model has been developed for radio-frequency (RF) silicon negative differential resistance (NDR) device simulation on the TCAD platform. The BTBT mechanism in a forward-biased tunnel junction is modelled based on a generation-recombination term in a continuity equation by considering a spatially varying electric field through the tunnelling distance. Using this model, DC/AC characteristics of silicon NDR devices have been successfully described on a numerical device simulation platform. The calculated speed index from the junction capacitance and peak tunnelling current of the tunnel diode shows good agreement with experiments.
  • Keywords
    capacitance; elemental semiconductors; semiconductor device models; silicon; tunnel diodes; Si; forward-biased tunnel junction; generation-recombination term; junction capacitance; low resistive band-to-band tunnelling model; negative-differential resistance; numerical device simulation platform; radio-frequency silicon tunnel diode; tunnelling current; tunnelling distance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20082737
  • Filename
    4668414