Title :
Novel technique of nickel disilicide formation
Author :
Singh, Awatar ; Khokle, W.S. ; Khokle, W.S.
Author_Institution :
CEERI, Pilani, Rajasthan, India
fDate :
6/1/1987 12:00:00 AM
Abstract :
This letter gives the first report of a novel technique of nickel disilicide formation by interaction of 1500 Å thick resistively heated tungsten filament evaporated nickel film with P-Si
Keywords :
Annealing; Chemicals; Conductivity; Grain size; Impurities; Insulation; Nickel; Polyimides; Tungsten; Very large scale integration;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/PROC.1987.13811
