• DocumentCode
    981717
  • Title

    Spatial pattern formation via reaction-diffusion dynamics in 32×32×4 CNN chip

  • Author

    Shi, Bertram E. ; Luo, Tao

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., China
  • Volume
    51
  • Issue
    5
  • fYear
    2004
  • fDate
    5/1/2004 12:00:00 AM
  • Firstpage
    939
  • Lastpage
    947
  • Abstract
    Reaction-diffusion dynamics have been proposed to explain pattern-formation behavior in a variety of systems, e.g., chemical and biological. This paper describes a cellular neural network chip that exhibits spatially organized patterns of activity, which are formed by reaction diffusion. The chip contains four 32×32 cell arrays of transistors which are locally coupled and operate in weak inversion. Typical patterns consist of alternating regions of high- and low-drain currents with a preferred width, but no preferred orientation. Experimental, theoretical, and simulation results for this chip are in complete concordance, demonstrating that conventional very large-scale integration technology can be an ideal substrate for studying the spatio-temporal dynamics and applications of reaction-diffusion. The chip, which was fabricated in a 0.5-μm process, settles to steady-state patterns within several hundred microseconds and dissipates 10.55 mW.
  • Keywords
    VLSI; cellular neural nets; nonlinear dynamical systems; pattern formation; reaction-diffusion systems; CMOS; CNN chip; Turing pattern; nonlinear circuits; nonlinear dynamics; reaction diffusion; reaction-diffusion dynamics; spatial pattern formation; spatio-temporal dynamics; substrate; very large-scale integration technology; Biological system modeling; CMOS technology; Cellular neural networks; Chemicals; Equations; Inhibitors; Large scale integration; Pattern formation; Steady-state; Very large scale integration; Analog very large-scale integration; CMOS; CNN; Turing pattern; VLSI; cellular neural network; nonlinear circuits; nonlinear dynamics; pattern formation; reaction diffusion;
  • fLanguage
    English
  • Journal_Title
    Circuits and Systems I: Regular Papers, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1549-8328
  • Type

    jour

  • DOI
    10.1109/TCSI.2004.827628
  • Filename
    1296806