Title :
Contact resistance of polysilicon silicon interconnections
Author :
Reeves, Geoffrey K. ; Harrison, H.B.
Author_Institution :
Telecom Australia Research Laboratories, Clayton, Australia
Abstract :
Electrical contacts to poly are an important part of current silicon technology. In this letter we present a method of calculating the electrical characteristics for a planar poly to silicon contact. An interesting and significant result that is derived and discussed is a minimum contact resistance that is a strong function not only of the specific contact resistance of the contact interface but also of the contact geometry.
Keywords :
contact resistance; electrical contacts; elemental semiconductors; integrated circuit technology; large scale integration; silicon; VLSI; contact resistance; electrical contacts; integrated circuit technology; poly Si-Si interconnections;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19820741
