DocumentCode :
982520
Title :
Nondestructive Readout of Ferroelectric-Gate Field-Effect Transistor Memory With an Intermediate Electrode by Using an Improved Operation Method
Author :
Horita, Susumu ; Trinh, Bui Nguyen Quoc
Author_Institution :
Sch. of Mater. Sci., Japan Adv. Inst. of Sci. & Technol., Nomi
Volume :
55
Issue :
11
fYear :
2008
Firstpage :
3200
Lastpage :
3207
Abstract :
We investigated the reading and writing of ferroelectric-gate field-effect transistor memory with an intermediate electrode (IF-FET) to achieve perfect nondestructive readouts. In the previous operation method, although the difference in output voltage DeltaV O between positive (P r +) and negative (P r -) remanent polarization memory states was adequate for the first reading time, the nondestructive readout for the P r - state was seriously degraded due to the generation of nonreturning domains. In order to solve this issue, a P r 0 memory state was used instead of the previous P r - memory state. The P r 0 state was induced by applying a pulse combined with a positive voltage (V W +) and a negative voltage (V W -). V W + was to reset the previously written memory states, and V W - was to control the amount of remanent polarization. In addition, in order to extinguish perfectly the nonreturning domains, a negative voltage V R - was applied for data reading, following a positive voltage V R +, where V R + was determined for clear decoding. The appropriate heights of the writing and reading voltages were determined individually from the viewpoint of good nondestructive readout and large DeltaV O . As a result, it was verified experimentally that the reading endurance reached more than 108 cycles and that the retention time of IF-FET at 150degC was possible to exceed ten years.
Keywords :
dielectric polarisation; ferroelectric storage; field effect transistors; readout electronics; data reading; ferroelectric-gate field-effect transistor memory; intermediate electrode; nondestructive readout; remanent polarization memory states; Buffer layers; Electrodes; FETs; Ferroelectric films; Ferroelectric materials; High K dielectric materials; Polarization; Substrates; Voltage; Writing; Ferroelectric gate; ferroelectric memory; nondestructive readout; reading endurance; retention;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.2003329
Filename :
4668546
Link To Document :
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