• DocumentCode
    982566
  • Title

    An Application-Driven Improvement of the Drift–Diffusion Model for Carrier Transport in Decanano-Scaled CMOS Devices

  • Author

    Kampen, Christian ; Burenkov, Alexander ; Lorenz, Jürgen ; Ryssel, Heiner ; Aubry-Fortuna, Valérie ; Bournel, Arnaud

  • Author_Institution
    Fraunhofer Inst. of Integrated Syst. & Device Technol., Erlangen
  • Volume
    55
  • Issue
    11
  • fYear
    2008
  • Firstpage
    3227
  • Lastpage
    3235
  • Abstract
    This paper presents a quantum-mechanical modification of the conventional drift-diffusion model for simulation of quasi-ballistic carrier transport under high-field conditions. Thereby, the saturation velocity of charge carriers has been adjusted in dependence on the local electrostatic potential, so that adequate simulation results were obtained for different device dimensions, doping concentration, and supply voltage. The energy dissipation of the electrons has been taken into account by using a self-heating of the device in dependence on thermal material resistances. A good agreement to Monte Carlo simulations and experimental results has been reached for the suggested model.
  • Keywords
    CMOS integrated circuits; Monte Carlo methods; thermal resistance; Monte Carlo simulations; decanano-scaled CMOS devices; drift-diffusion model; energy dissipation; local electrostatic potential; quantum-mechanical modification; quasi-ballistic carrier transport; self-heating; thermal material resistances; Charge carriers; Circuit simulation; Doping; Electron mobility; Electrostatics; Monte Carlo methods; Semiconductor device modeling; Semiconductor process modeling; Silicon; Voltage; Carrier transport; Monte Carlo (MC); device simulation; drift–diffusion (DD); numerical simulation; quasi-ballistic; self-heating;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2004474
  • Filename
    4668551