DocumentCode
982566
Title
An Application-Driven Improvement of the Drift–Diffusion Model for Carrier Transport in Decanano-Scaled CMOS Devices
Author
Kampen, Christian ; Burenkov, Alexander ; Lorenz, Jürgen ; Ryssel, Heiner ; Aubry-Fortuna, Valérie ; Bournel, Arnaud
Author_Institution
Fraunhofer Inst. of Integrated Syst. & Device Technol., Erlangen
Volume
55
Issue
11
fYear
2008
Firstpage
3227
Lastpage
3235
Abstract
This paper presents a quantum-mechanical modification of the conventional drift-diffusion model for simulation of quasi-ballistic carrier transport under high-field conditions. Thereby, the saturation velocity of charge carriers has been adjusted in dependence on the local electrostatic potential, so that adequate simulation results were obtained for different device dimensions, doping concentration, and supply voltage. The energy dissipation of the electrons has been taken into account by using a self-heating of the device in dependence on thermal material resistances. A good agreement to Monte Carlo simulations and experimental results has been reached for the suggested model.
Keywords
CMOS integrated circuits; Monte Carlo methods; thermal resistance; Monte Carlo simulations; decanano-scaled CMOS devices; drift-diffusion model; energy dissipation; local electrostatic potential; quantum-mechanical modification; quasi-ballistic carrier transport; self-heating; thermal material resistances; Charge carriers; Circuit simulation; Doping; Electron mobility; Electrostatics; Monte Carlo methods; Semiconductor device modeling; Semiconductor process modeling; Silicon; Voltage; Carrier transport; Monte Carlo (MC); device simulation; drift–diffusion (DD); numerical simulation; quasi-ballistic; self-heating;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2008.2004474
Filename
4668551
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