DocumentCode :
982702
Title :
High-frequency ultrasonic cleaning tank utilizing oblique incidence
Author :
Hatano, Hajime ; Kanai, Sadao
Author_Institution :
Dept. of Appl. Electron., Sci. Univ. of Tokyo, Japan
Volume :
43
Issue :
4
fYear :
1996
fDate :
7/1/1996 12:00:00 AM
Firstpage :
531
Lastpage :
535
Abstract :
Transmission characteristics of a double-structured tank, used for high-frequency (1 MHz range) ultrasonic cleaning of semiconductor wafers and substrates, were improved by utilizing oblique incidence of ultrasonic waves. As the sound transmittivity through a plate in water varies with the angle of incidence, the bottom of the Pyrex glass inner container was slanted at the angle where strong transmission occurred. In the slant-bottom container, an intensive and uniform sound pressure distribution was measured with a polyvinylidene fluoride (PVDF) hydrophone probe. In comparison with the conventional horizontal-bottom container, it was shown that the distributions as well as amplitude of sound pressure were remarkably improved by slanting the bottom of the inner container at the proper angle.
Keywords :
semiconductor technology; ultrasonic cleaning; 1 MHz; PVDF hydrophone probe; Pyrex glass plate; double-structured tank; high-frequency ultrasonic cleaning; oblique incidence; semiconductor substrates; semiconductor wafers; slant-bottom container; sound pressure distribution; sound transmittivity; Cleaning; Containers; Frequency; Glass; Power generation; Pressure measurement; Probes; Sonar equipment; Substrates; Ultrasonic variables measurement;
fLanguage :
English
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-3010
Type :
jour
DOI :
10.1109/58.503712
Filename :
503712
Link To Document :
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