• DocumentCode
    982760
  • Title

    Toward Nanowire Electronics

  • Author

    Appenzeller, Joerg ; Knoch, Joachim ; Björk, Mikael T. ; Riel, Heike ; Schmid, Heinz ; Riess, Walter

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN
  • Volume
    55
  • Issue
    11
  • fYear
    2008
  • Firstpage
    2827
  • Lastpage
    2845
  • Abstract
    This paper discusses the electronic transport properties of nanowire field-effect transistors (NW-FETs). Four different device concepts are studied in detail: Schottky-barrier NW-FETs with metallic source and drain contacts, conventional-type NW-FETs with doped NW segments as source and drain electrodes, and, finally, two new concepts that enable steep turn-on characteristics, namely, NW impact ionization FETs and tunnel NW-FETs. As it turns out, NW-FETs are, to a large extent, determined by the device geometry, the dimensionality of the electronic transport, and the way of making contacts to the NW. Analytical as well as simulation results are compared with experimental data to explain the various factors impacting the electronic transport in NW-FETs.
  • Keywords
    Schottky barriers; Schottky gate field effect transistors; impact ionisation; nanoelectronics; nanowires; tunnel transistors; Schottky-barrier NW-FET; conventional-type NW-FET; device geometry; doped NW segments; drain contacts; electronic transport dimensionality; electronic transport properties; impact ionization FET; metallic source; nanowire electronics; nanowire field-effect transistors; steep turn-on characteristics; tunnel NW-FET; Doping; Electrodes; Electrostatics; FETs; Laboratories; Logic devices; MOSFETs; Nanoelectronics; Nanomaterials; Nanoscale devices; Impact ionization; MOSFET; Schottky-barrier; VLS growth; nanowire FET; nanowire growth; steep slope transistors; tunnel FET;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2008011
  • Filename
    4668569