DocumentCode
982760
Title
Toward Nanowire Electronics
Author
Appenzeller, Joerg ; Knoch, Joachim ; Björk, Mikael T. ; Riel, Heike ; Schmid, Heinz ; Riess, Walter
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN
Volume
55
Issue
11
fYear
2008
Firstpage
2827
Lastpage
2845
Abstract
This paper discusses the electronic transport properties of nanowire field-effect transistors (NW-FETs). Four different device concepts are studied in detail: Schottky-barrier NW-FETs with metallic source and drain contacts, conventional-type NW-FETs with doped NW segments as source and drain electrodes, and, finally, two new concepts that enable steep turn-on characteristics, namely, NW impact ionization FETs and tunnel NW-FETs. As it turns out, NW-FETs are, to a large extent, determined by the device geometry, the dimensionality of the electronic transport, and the way of making contacts to the NW. Analytical as well as simulation results are compared with experimental data to explain the various factors impacting the electronic transport in NW-FETs.
Keywords
Schottky barriers; Schottky gate field effect transistors; impact ionisation; nanoelectronics; nanowires; tunnel transistors; Schottky-barrier NW-FET; conventional-type NW-FET; device geometry; doped NW segments; drain contacts; electronic transport dimensionality; electronic transport properties; impact ionization FET; metallic source; nanowire electronics; nanowire field-effect transistors; steep turn-on characteristics; tunnel NW-FET; Doping; Electrodes; Electrostatics; FETs; Laboratories; Logic devices; MOSFETs; Nanoelectronics; Nanomaterials; Nanoscale devices; Impact ionization; MOSFET; Schottky-barrier; VLS growth; nanowire FET; nanowire growth; steep slope transistors; tunnel FET;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2008.2008011
Filename
4668569
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