Title :
The spreading resistance error in the vertical Kelvin test resistor structure for the specific contact resistivity
Author :
Lee, Chung Len ; Yang, Wen Luh ; Lei, Tan Fu
Author_Institution :
Inst. of Electron., Nat. Chiao Tung Univ., Hsin Chu, Taiwan
fDate :
4/1/1988 12:00:00 AM
Abstract :
The spreading resistance error in the vertical Kelvin test resistor (VTR) structure is studied based on an analytic approach. It is found that it is always less than the error existing in the horizontal test structures and can be expressed as the product of the sheet resistance and the square of the junction depth of the conductor resistor divided by a factor approximately equal to 2
Keywords :
ohmic contacts; semiconductor device models; semiconductor-metal boundaries; analytic approach; conductor resistor; model; sheet resistance; specific contact resistivity; spreading resistance error; square of junction depth; vertical Kelvin test resistor structure; Conductivity; Contact resistance; Doping; Electrical resistance measurement; Kelvin; Resistors; Silicon; Testing; Video recording; Voltage measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
