Title :
Process, design and characterization of ion implanted bubble devices
Author :
Jouve, H. ; Magnin, J. ; Hervy, P. ; Mattenet, P.
Author_Institution :
Leti, Commissariat à l´´Energie Atomique, Grenoble, France
fDate :
11/1/1981 12:00:00 AM
Abstract :
The material characteristics, processing technology, implantation conditions and circuit design are described for a bubble memory chip using ion implantation in order to define the propagation level. Nucleation, transfer between loops and stretching for detection use hairpin conductors. A passive merge is designed in the major loop by taking advantage of the magnetocrystalline anisotropy of the garnet film. At 35 oe of drive field, a minimum of 10 oe operating margins is obtained for all these different functions. The thin Fe-Ni detector has a 1 mV/mA sensitivity with a low noise level.
Keywords :
Ion implantation; Magnetic bubble device fabrication; Anisotropic magnetoresistance; Circuit synthesis; Conducting materials; Detectors; Garnet films; Ion implantation; Magnetic anisotropy; Noise level; Perpendicular magnetic anisotropy; Process design;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1981.1061493