DocumentCode :
984351
Title :
Light sensitivity of Al0.25Ga0.75As/GaAs modulation-doped structures grown by molecular beam epitaxy: effect of substrate temperature
Author :
Fischer, Ray ; Arnold, Dorian ; Thorne, R.E. ; Drummond, T.J. ; Morko¿¿, H.
Author_Institution :
University of Illinois, Department of Electrical Engineering and Coordinated Science Laboratory, Urbana, USA
Volume :
19
Issue :
6
fYear :
1983
Firstpage :
200
Lastpage :
202
Abstract :
The sensitivity of carrier concentration and mobility of Al0.25Ga0.75As/GaAs modulation-doped structures to light exposure has been studied. The light sensitivity of both parameters was found to be strongly dependent on the growth temperature of the Al0.25Ga0.75As which was varied between 580°C and 695°C. A growth temperature of about 610°C was observed to produce the least light sensitivity, while a growth temperature of 660°C resulted in the most sensitivity to light. The corresponding minimum and maximum changes in carrier concentration, measured at 10 K, were 5% and 52% of the dark values, respectively, while changes in mobility were 2% and 40%, respectively. A persistent photoconductivity effect was also observed in the samples. The minimum in this effect was found to be a 1% change in 10 K carrier concentration at a growth temperature of 610°C.
Keywords :
III-V semiconductors; aluminium compounds; carrier density; carrier mobility; gallium arsenide; molecular beam epitaxial growth; photoconductivity; semiconductor epitaxial layers; semiconductor growth; Al0.25Ga0.75As/GaAs modulation-doped structures; carrier concentration; carrier mobility; growth temperature; light sensitivity; molecular beam epitaxy; persistent photoconductivity effect; substrate temperature effect;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19830139
Filename :
4247498
Link To Document :
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