DocumentCode
984351
Title
Light sensitivity of Al0.25Ga0.75As/GaAs modulation-doped structures grown by molecular beam epitaxy: effect of substrate temperature
Author
Fischer, Ray ; Arnold, Dorian ; Thorne, R.E. ; Drummond, T.J. ; Morko¿¿, H.
Author_Institution
University of Illinois, Department of Electrical Engineering and Coordinated Science Laboratory, Urbana, USA
Volume
19
Issue
6
fYear
1983
Firstpage
200
Lastpage
202
Abstract
The sensitivity of carrier concentration and mobility of Al0.25Ga0.75As/GaAs modulation-doped structures to light exposure has been studied. The light sensitivity of both parameters was found to be strongly dependent on the growth temperature of the Al0.25Ga0.75As which was varied between 580°C and 695°C. A growth temperature of about 610°C was observed to produce the least light sensitivity, while a growth temperature of 660°C resulted in the most sensitivity to light. The corresponding minimum and maximum changes in carrier concentration, measured at 10 K, were 5% and 52% of the dark values, respectively, while changes in mobility were 2% and 40%, respectively. A persistent photoconductivity effect was also observed in the samples. The minimum in this effect was found to be a 1% change in 10 K carrier concentration at a growth temperature of 610°C.
Keywords
III-V semiconductors; aluminium compounds; carrier density; carrier mobility; gallium arsenide; molecular beam epitaxial growth; photoconductivity; semiconductor epitaxial layers; semiconductor growth; Al0.25Ga0.75As/GaAs modulation-doped structures; carrier concentration; carrier mobility; growth temperature; light sensitivity; molecular beam epitaxy; persistent photoconductivity effect; substrate temperature effect;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19830139
Filename
4247498
Link To Document