DocumentCode :
984356
Title :
Determination of the stress profile in ion implanted garnets
Author :
Kersusan, J.P. ; Gerard, P. ; Gailliard, J.P. ; Jouve, H.
Author_Institution :
LETI, Commissariat A l´´Energie Atomique, Grenoble.
Volume :
17
Issue :
6
fYear :
1981
fDate :
11/1/1981 12:00:00 AM
Firstpage :
2917
Lastpage :
2919
Abstract :
This paper presents original results on the stress profile as determined by an optical interference fringes technique for a neon implantation at a dose of 2 × 1014cm-2. The stress is found from the deformation of the sample due to the implantation. A stripping method is applied to get the stress profiles after respectively a 140°C and 400°C annealing.
Keywords :
Ion implantation; Magnetic bubble films; Mechanical factors; Optical interferometry; Annealing; Compressive stress; Etching; Garnets; Magnetic materials; Optical films; Particle beam optics; Stress measurement; Substrates; Temperature;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1981.1061494
Filename :
1061494
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=984356
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